By technologies develop and requirement, phase shift masks (PSM) have evolved as a enhancement about Lithography tool to extend resolution improvement.
TMC could offer Alternating Aperture Phase Shift Masks to support this product.
Many companies have come to realize the benefits of using 9" and 14” masks in Advanced Packaging Applications. A 9" and 14” mask can provide a single, complete exposure of an 8" (200 mm)/12”(300mm) wafer. A single exposure has the combined benefits of shorter processing time and reduced opportunity for process errors. Other applications taking advantage of 9"/14” masks include: IC Packaging, Probe Cards, Micro-Springs/MEMS.