New Technology Product

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Phase Shift Masks

By technologies develop and requirement, phase shift masks (PSM) have evolved as a enhancement about Lithography tool to extend resolution improvement.
TMC could offer Alternating Aperture Phase Shift Masks to support this product.

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Wafer Level Area Masks

Many companies have come to realize the benefits of using 9" and 14” masks in Advanced Packaging Applications. A 9" and 14” mask can provide a single, complete exposure of an 8" (200 mm)/12”(300mm) wafer. A single exposure has the combined benefits of shorter processing time and reduced opportunity for process errors. Other applications taking advantage of 9"/14” masks include: IC Packaging, Probe Cards, Micro-Springs/MEMS.