Standard Product

TMC is specialized in the research, development, manufacturing and sales of photomasks. We produce the mold for the manufacturing of IC and it is a build-to-order product. Conforming to the fast growth and continual evolution in semiconductor industry, we keep fully supplying all the needs of photomasks and contribute compression cycle time for new developed products, which always satisfy to our customers. With ongoing development and improvement of IC chip manufacturing in foundries, TMC supply photomasks and reticles for the following products.

  • 5X , 4X , 2.5X , 2X , Reticle for stepper
    Reticle Material Quartz
    Reticle Dimension 5"x5"x0.09"
    5"x5"x0.18"
    6"x6"x0.12"
    6"x6"x0.25"
    Stepper Type ASML,NIKON,CANON
    CD Tolerance Mean to target >=0.010 um
    Uniformity (3δ) >=0.010 um
    Registration >=0.020 um
    Defect 0.09 um
  • 1X Photomask (PE / MPA)
    Reticle Material Quartz
    Reticle Dimension 4"x4"x0.09"
    5"x5"x0.09"
    6"x6"x0.12"
    7"x7"x0.12"
    7"x7"x0.15"
    CD Tolerance ±0.1 um
    Registration ±0.2 um
    Defect <= 1dpsi @ 1um
  • 1X Photomask (PLA)
    Reticle Material SODA LINE
    Reticle Dimension 4"x4"x0.09"
    5"x5"x0.09"
    6"x6"x0.12"
    7"x7"x0.12"
    9"x9"x0.12"
    CD Tolerance ±0.3 um
    Registration ±2 um
    Defect <= 2dpsi @ 2um
  • UT 1X Reticle
    Reticle Material Quartz
    Reticle Dimension 3"x5"x0.09"
    5"x5"x0.09"
    6"x6"x0.25"
    CD Tolerance ±0.05 um
    Registration ±0.1 um
    Defect 0.5 um
  • Large Area Mask (LAM)
    Reticle Material SODA LINE
    Reticle Dimension 7"x7"x0.12"
    9"x9"x0.12"
    355.6x355.6x4.8 mm
    520x420x4.8 mm
    Min Line/Space 3 um
    Line Tolerance ±1.0 um
    Defect 5 um