OPC Reticle - Optical proximity correction



A special method using specific software to pre-compensate and/or add sub-resolution for optical proximity correction.

OPC is applicable to process below 0.35 um, enhances productivity by way of increased depth of focus (D.O.F.) in sub-micron process and improves exposure latitude, then the excellent yield and reliability could be expected by this advanced resolution of prevailing stepper. TMC is provided with quite well experience of reticles with OPC design pattern.